Geological Literature Search (GEOLIS) (Geological Survey of Japan / AIST)

Evaluation of Outermost Surface Temperature of Silicon Substrates during UV-Excited Ozone Oxidation at Low Temperature

Authors=KAMEDA Naoto, NISHIGUCHI Tetsuya, MORIKAWA Yoshiki, KEKURA Mitsuru, Nakamura Ken, USHIYAMA Tomoharu, NONAKA Hidehiko, ICHIMURA Shingo

Journal/Book_names=Analytical Sciences

volume=26

number=2

pages=273-276

Publish_year=2010

Publish_Country=JPN

Publisher=Japan Society for Analytical Chemistry

Language_of_Text=EN

Language_of_Abs=EN

ISSN=09106340

DOI=10.2116/analsci.26.273

ID=201020443

@id=https://gbank.gsj.jp/ld/resource/geolis/201020443