Geological Literature
Evaluation of Outermost Surface Temperature of Silicon Substrates during UV-Excited Ozone Oxidation at Low Temperature
KAMEDA Naoto, NISHIGUCHI Tetsuya, MORIKAWA Yoshiki, KEKURA Mitsuru, Nakamura Ken, USHIYAMA Tomoharu, NONAKA Hidehiko, ICHIMURA Shingo
| item | description |
|---|---|
| Title | Evaluation of Outermost Surface Temperature of Silicon Substrates during UV-Excited Ozone Oxidation at Low Temperature |
| Authors | KAMEDA Naoto, NISHIGUCHI Tetsuya, MORIKAWA Yoshiki, KEKURA Mitsuru, Nakamura Ken, USHIYAMA Tomoharu, NONAKA Hidehiko, ICHIMURA Shingo |
| Data name | Analytical Sciences |
| Volume | 26 |
| Num | 2 |
| Page | 273-276 |
| Year | 2010 |
| Publisher | Japan Society for Analytical Chemistry |
| Language | EN |
| Abstract language | EN |
| ISSN | 09106340 |
| GEOLIS URL | https://darc.gsj.jp/archives/detail?cls=geolis&pkey=201020443 |
| DOI | 10.2116/analsci.26.273 |
| @id | https://gbank.gsj.jp/ld/resource/geolis/201020443 |