Geological Literature Search (GEOLIS) (Geological Survey of Japan / AIST)

Moisture diffusion along the TiN/SiO2 interface and in plasma-enhanced chemical vapor deposited SiO2

Authors=XU G., CLARKE D.R., MA Q., FUJIMOTO H.

Journal/Book_names=Journal of Applied Physics

volume=88

number=6

pages=3695-3698

Publish_year=2000

Publish_Country=USA

Publisher=American Institute of Physics

Language_of_Text=EN

Language_of_Abs=EN

ISSN=218979

ID=200008508

@id=https://gbank.gsj.jp/ld/resource/geolis/200008508