Geological Literature
Moisture diffusion along the TiN/SiO2 interface and in plasma-enhanced chemical vapor deposited SiO2
XU G., CLARKE D.R., MA Q., FUJIMOTO H.
| item | description |
|---|---|
| Title | Moisture diffusion along the TiN/SiO2 interface and in plasma-enhanced chemical vapor deposited SiO2 |
| Authors | XU G., CLARKE D.R., MA Q., FUJIMOTO H. |
| Data name | Journal of Applied Physics |
| Volume | 88 |
| Num | 6 |
| Page | 3695-3698 |
| Year | 2000 |
| Publisher | American Institute of Physics |
| Language | EN |
| Abstract language | EN |
| ISSN | 218979 |
| GEOLIS URL | https://darc.gsj.jp/archives/detail?cls=geolis&pkey=200008508 |
| @id | https://gbank.gsj.jp/ld/resource/geolis/200008508 |