Scanning tunneling microscopy and spectroscopy characterization of ion-beam-induced dielectric degradation in ultrathin SiO2 films and its thermal recovery process

Authors=WATANABE Heiji, BABA Toshio, ICHIKAWA Masakazu

Journal/Book_names=Journal of Applied Physics

volume=87

number=1

pages=44-48

Publish_year=2000

Publish_Country=USA

Publisher=American Institute of Physics

Language_of_Text=EN

Language_of_Abs=EN

ISSN=218979

ID=200004448