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Scanning tunneling microscopy and spectroscopy characterization of ion-beam-induced dielectric degradation in ultrathin SiO2 films and its thermal recovery process
WATANABE Heiji, BABA Toshio, ICHIKAWA Masakazu
itemdescription
TitleScanning tunneling microscopy and spectroscopy characterization of ion-beam-induced dielectric degradation in ultrathin SiO2 films and its thermal recovery process
AuthorsWATANABE Heiji, BABA Toshio, ICHIKAWA Masakazu
Data nameJournal of Applied Physics
Volume87
Num1
Page44-48
Year2000
PublisherAmerican Institute of Physics
LanguageEN
Abstract languageEN
ISSN218979
GEOLIS URLhttps://darc.gsj.jp/archives/detail?cls=geolis&pkey=200004448
@idhttps://gbank.gsj.jp/ld/resource/geolis/200004448