Reactive-flow simulation of the hot-filament chemical-vapor deposition of diamond

Authors=KONDOH Eiichi, TANAKA Kenji, OHTA Tomohiro

Journal/Book_names=Journal of Applied Physics

volume=74

number=7

pages=4513-4520

Publish_year=1993

Publish_Country=USA

Publisher=American Institute of Physics

Language_of_Text=EN

Language_of_Abs=EN

ISSN=00218979

ID=199303245