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Reactive-flow simulation of the hot-filament chemical-vapor deposition of diamond
KONDOH Eiichi, TANAKA Kenji, OHTA Tomohiro
itemdescription
TitleReactive-flow simulation of the hot-filament chemical-vapor deposition of diamond
AuthorsKONDOH Eiichi, TANAKA Kenji, OHTA Tomohiro
Data nameJournal of Applied Physics
Volume74
Num7
Page4513-4520
Year1993
PublisherAmerican Institute of Physics
LanguageEN
Abstract languageEN
ISSN00218979
@idhttps://gbank.gsj.jp/ld/resource/geolis/199303245