Preparation of rho-type silicon films by plasma decomposition of a SiH4/H2/BF3 gas mixture

Authors=KAKINUMA H., MOHRI M., TSURUOKA T.

Journal/Book_names=Journal of Applied Physics

volume=74

number=7

pages=4614-4619

Publish_year=1993

Publish_Country=USA

Publisher=American Institute of Physics

Language_of_Text=EN

Language_of_Abs=EN

ISSN=00218979

ID=199302255