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Preparation of rho-type silicon films by plasma decomposition of a SiH4/H2/BF3 gas mixture
KAKINUMA H., MOHRI M., TSURUOKA T.
itemdescription
TitlePreparation of rho-type silicon films by plasma decomposition of a SiH4/H2/BF3 gas mixture
AuthorsKAKINUMA H., MOHRI M., TSURUOKA T.
Data nameJournal of Applied Physics
Volume74
Num7
Page4614-4619
Year1993
PublisherAmerican Institute of Physics
LanguageEN
Abstract languageEN
ISSN00218979
GEOLIS URLhttps://darc.gsj.jp/archives/detail?cls=geolis&pkey=199302255
@idhttps://gbank.gsj.jp/ld/resource/geolis/199302255