Geological Literature Search (GEOLIS) (Geological Survey of Japan / AIST)

Selective Germanium Epitaxial Growth on Silicon Using CVD Technology with Ultra-pure Gases

Authors=KOBAYASHI Shin-ichi, CHENG Min-Lin, KOHLHASE Armin, SATO Taketoshi, MUROTA Junichi, MIKOSHIBA Nobuo

Journal/Book_names=Journal of Crystal Growth, Crystal Growth 1989, Part 1, Proceedings of the Ninth International Conference on Crystal Growth

volume=99

number=1-4

pages=259-262

Publish_year=1990

Publish_Country=NLD

Publisher=North-Holland

Language_of_Text=EN

Language_of_Abs=EN

ISSN=00220248

DOI=10.1016/0022-0248(90)90523-N

ID=199002336

@id=https://gbank.gsj.jp/ld/resource/geolis/199002336