Geological Literature
Selective Germanium Epitaxial Growth on Silicon Using CVD Technology with Ultra-pure Gases
KOBAYASHI Shin-ichi, CHENG Min-Lin, KOHLHASE Armin, SATO Taketoshi, MUROTA Junichi, MIKOSHIBA Nobuo
| item | description |
|---|---|
| Title | Selective Germanium Epitaxial Growth on Silicon Using CVD Technology with Ultra-pure Gases |
| Authors | KOBAYASHI Shin-ichi, CHENG Min-Lin, KOHLHASE Armin, SATO Taketoshi, MUROTA Junichi, MIKOSHIBA Nobuo |
| Data name | Journal of Crystal Growth, Crystal Growth 1989, Part 1, Proceedings of the Ninth International Conference on Crystal Growth |
| Volume | 99 |
| Num | 1-4 |
| Page | 259-262 |
| Year | 1990 |
| Publisher | North-Holland |
| Language | EN |
| Abstract language | EN |
| ISSN | 00220248 |
| GEOLIS URL | https://darc.gsj.jp/archives/detail?cls=geolis&pkey=199002336 |
| DOI | 10.1016/0022-0248(90)90523-N |
| @id | https://gbank.gsj.jp/ld/resource/geolis/199002336 |