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Evaluation of the Cleanliness of Ultrapure Water by the Analysis for Metal Concentration Depositted on Si Wafer Surface Using Vapor Phase Decomposition/Inductively Coupled Plasma Mass Spectrometry
KATO Toshimasa, HOSHI Shigeyuki, NOGUCHI Toshihiko, CHUUMAN Takaaki
itemdescription
TitleEvaluation of the Cleanliness of Ultrapure Water by the Analysis for Metal Concentration Depositted on Si Wafer Surface Using Vapor Phase Decomposition/Inductively Coupled Plasma Mass Spectrometry
AuthorsKATO Toshimasa, HOSHI Shigeyuki, NOGUCHI Toshihiko, CHUUMAN Takaaki
Data nameBunseki Kagaku
Volume59
Num7
Page559-563
Year2010
PublisherJapan Society for Analytical Chemistry
LanguageJA
Abstract languageEN
ISSN05251931
GEOLIS URLhttps://darc.gsj.jp/archives/detail?cls=geolis&pkey=201021768
DOI10.2116/bunsekikagaku.59.559
@idhttps://gbank.gsj.jp/ld/resource/geolis/201021768