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Chemical adsorption of silicic acid to aluminum combined with cation exchange and chelate resins as model compounds of the surface of microbes
ARAMAKI Yoshinobu, YOKOYAMA Takushi, OKAUE Yoshihiro, WATANABE Koichiro
itemdescription
TitleChemical adsorption of silicic acid to aluminum combined with cation exchange and chelate resins as model compounds of the surface of microbes
AuthorsARAMAKI Yoshinobu, YOKOYAMA Takushi, OKAUE Yoshihiro, WATANABE Koichiro
Data nameChemical Geology
Volume212
Num3-4
Page339-349
Year2004
PublisherElsevier B.V.
LanguageEN
Abstract languageEN
ISSN92541
DOI10.1016/j.chemgeo.2004.08.023
@idhttps://gbank.gsj.jp/ld/resource/geolis/200430329