Geological Literature
Preparation of HfO2 nano-films by atomic layer deposition using HfCl4 and O2 under atmospheric pressure
NONOBE Shinichi, TAKAHASHI Naoyuki, NAKAMURA Takato
| item | description |
|---|---|
| Title | Preparation of HfO2 nano-films by atomic layer deposition using HfCl4 and O2 under atmospheric pressure |
| Authors | NONOBE Shinichi, TAKAHASHI Naoyuki, NAKAMURA Takato |
| Data name | Solid State Sciences |
| Volume | 6 |
| Num | 11 |
| Page | 1217-1219 |
| Year | 2004 |
| Publisher | Elsevier SAS |
| Language | EN |
| Abstract language | EN |
| ISSN | 12932558 |
| GEOLIS URL | https://darc.gsj.jp/archives/detail?cls=geolis&pkey=200429363 |
| DOI | 10.1016/j.solidstatesciences.2004.07.030 |
| @id | https://gbank.gsj.jp/ld/resource/geolis/200429363 |