Geological Literature
Effects of end-of-range dislocation loops on transient enhanced diffusion of indum implanted in silicon
NODA T., ODANAKA S., UMIMOTO H.
item | description |
---|---|
Title | Effects of end-of-range dislocation loops on transient enhanced diffusion of indum implanted in silicon |
Authors | NODA T., ODANAKA S., UMIMOTO H. |
Data name | Journal of Applied Physics |
Volume | 88 |
Num | 9 |
Page | 4980-4984 |
Year | 2000 |
Publisher | American Institute of Physics |
Language | EN |
Abstract language | EN |
ISSN | 00218979 |
GEOLIS URL | https://darc.gsj.jp/archives/detail?cls=geolis&pkey=200009371 |
@id | https://gbank.gsj.jp/ld/resource/geolis/200009371 |