Geological Literature
Effects of end-of-range dislocation loops on transient enhanced diffusion of indum implanted in silicon
NODA T., ODANAKA S., UMIMOTO H.
| item | description |
|---|---|
| Title | Effects of end-of-range dislocation loops on transient enhanced diffusion of indum implanted in silicon |
| Authors | NODA T., ODANAKA S., UMIMOTO H. |
| Data name | Journal of Applied Physics |
| Volume | 88 |
| Num | 9 |
| Page | 4980-4984 |
| Year | 2000 |
| Publisher | American Institute of Physics |
| Language | EN |
| Abstract language | EN |
| ISSN | 00218979 |
| @id | https://gbank.gsj.jp/ld/resource/geolis/200009371 |