Geological Literature
Characterization of Si nanocrystals grown by annealing SiO2 films with uniform concentrations of implanted Si
GUHA S., QADRI S.B., MUSKET R.G., WALL M.A., SHIMIZU-IWAYAMA Tsutomu
| item | description |
|---|---|
| Title | Characterization of Si nanocrystals grown by annealing SiO2 films with uniform concentrations of implanted Si |
| Authors | GUHA S., QADRI S.B., MUSKET R.G., WALL M.A., SHIMIZU-IWAYAMA Tsutomu |
| Data name | Journal of Applied Physics |
| Volume | 88 |
| Num | 7 |
| Page | 3954-3961 |
| Year | 2000 |
| Publisher | American Institute of Physics |
| Language | EN |
| Abstract language | EN |
| ISSN | 00218979 |
| @id | https://gbank.gsj.jp/ld/resource/geolis/200008722 |