Geological Literature
Characterization of Si nanocrystals grown by annealing SiO2 films with uniform concentrations of implanted Si
GUHA S., QADRI S.B., MUSKET R.G., WALL M.A., SHIMIZU-IWAYAMA Tsutomu
item | description |
---|---|
Title | Characterization of Si nanocrystals grown by annealing SiO2 films with uniform concentrations of implanted Si |
Authors | GUHA S., QADRI S.B., MUSKET R.G., WALL M.A., SHIMIZU-IWAYAMA Tsutomu |
Data name | Journal of Applied Physics |
Volume | 88 |
Num | 7 |
Page | 3954-3961 |
Year | 2000 |
Publisher | American Institute of Physics |
Language | EN |
Abstract language | EN |
ISSN | 00218979 |
@id | https://gbank.gsj.jp/ld/resource/geolis/200008722 |