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Determination of trace amounts of phosphorus high-purity silicon by ICP-MS after acid-vapor decomposition under elevated pressure and isolation as a molybdophosphate-dodecyltrimethylammonium bromide ion pair
FUJIMOTO Kyoko, ITO Masao, SHIMURA Makoto, YOSHIOKA Keiichi
itemdescription
TitleDetermination of trace amounts of phosphorus high-purity silicon by ICP-MS after acid-vapor decomposition under elevated pressure and isolation as a molybdophosphate-dodecyltrimethylammonium bromide ion pair
AuthorsFUJIMOTO Kyoko, ITO Masao, SHIMURA Makoto, YOSHIOKA Keiichi
Data nameBunseki Kagaku
Volume47
Num3
Page187-193
Year1998
PublisherJapan Society for Analytical Chemistry
LanguageJA
Abstract languageEN, JA
ISSN05251931
GEOLIS URLhttps://darc.gsj.jp/archives/detail?cls=geolis&pkey=199800972
DOI10.2116/bunsekikagaku.47.187
@idhttps://gbank.gsj.jp/ld/resource/geolis/199800972