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Dissolution Rates of Silica Scale and Silica Gel at the low temperature up to 340K
NIIBORI Yuichi, KUNITA Masahisa, TOCHIYAMA Osamu, CHIDA Tadashi
itemdescription
TitleDissolution Rates of Silica Scale and Silica Gel at the low temperature up to 340K
AuthorsNIIBORI Yuichi, KUNITA Masahisa, TOCHIYAMA Osamu, CHIDA Tadashi
Data nameProceedings of the 33rd Conference of Societe Internationale des Techniques Hydrothermales (SITH) in Hakone, Kanagawa, Japan
Page122-125
Year1997
PublisherAssociation Japonaise des Techniques Hydrothermales (SITH Japan)
LanguageEN
Abstract languageEN
@idhttps://gbank.gsj.jp/ld/resource/geolis/199705778