Geological Literature
Annealing behavior of MeV implanted carbon in silicon
ISOMAE Seiichi, ISHIBA Tsutomu
| item | description |
|---|---|
| Title | Annealing behavior of MeV implanted carbon in silicon |
| Authors | ISOMAE Seiichi, ISHIBA Tsutomu |
| Data name | Journal of Applied Physics |
| Volume | 74 |
| Num | 6 |
| Page | 3815-3820 |
| Year | 1993 |
| Publisher | American Institute of Physics |
| Language | EN |
| Abstract language | EN |
| ISSN | 218979 |
| GEOLIS URL | https://darc.gsj.jp/archives/detail?cls=geolis&pkey=199301987 |
| @id | https://gbank.gsj.jp/ld/resource/geolis/199301987 |