Geological Literature
Characterization and application of fine-patterned Si/CoSi2/Si double heterostructures fabricated by self-aligned, two-step MBE
MIYAO Masanobu, NAKAGAWA Kiyokazu, NAKAMURA Nobuo, OHSHIMA Takashi
| item | description |
|---|---|
| Title | Characterization and application of fine-patterned Si/CoSi2/Si double heterostructures fabricated by self-aligned, two-step MBE |
| Authors | MIYAO Masanobu, NAKAGAWA Kiyokazu, NAKAMURA Nobuo, OHSHIMA Takashi |
| Data name | Journal of Crystal Growth, Molecular Beam Epitaxy 1990, Proceedings of the Sixth International Conference on Molecular Beam Epitaxy |
| Volume | 111 |
| Num | 1-4 |
| Page | 957-960 |
| Year | 1991 |
| Publisher | North-Holland |
| Language | EN |
| Abstract language | EN |
| ISSN | 00220248 |
| DOI | 10.1016/0022-0248(91)91114-P |
| @id | https://gbank.gsj.jp/ld/resource/geolis/199104054 |