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Characterization and application of fine-patterned Si/CoSi2/Si double heterostructures fabricated by self-aligned, two-step MBE
MIYAO Masanobu, NAKAGAWA Kiyokazu, NAKAMURA Nobuo, OHSHIMA Takashi
itemdescription
TitleCharacterization and application of fine-patterned Si/CoSi2/Si double heterostructures fabricated by self-aligned, two-step MBE
AuthorsMIYAO Masanobu, NAKAGAWA Kiyokazu, NAKAMURA Nobuo, OHSHIMA Takashi
Data nameJournal of Crystal Growth, Molecular Beam Epitaxy 1990, Proceedings of the Sixth International Conference on Molecular Beam Epitaxy
Volume111
Num1-4
Page957-960
Year1991
PublisherNorth-Holland
LanguageEN
Abstract languageEN
ISSN00220248
GEOLIS URLhttps://darc.gsj.jp/archives/detail?cls=geolis&pkey=199104054
DOI10.1016/0022-0248(91)91114-P
@idhttps://gbank.gsj.jp/ld/resource/geolis/199104054