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Growth Processes in the Initial Stages of Deposition of Ge Films on (100)Si Surfaces by GeH4 Source Molecular Beam Epitaxy
KOIDE Y., ZAIMA S., OHSHIMA N., YASUDA Y.
itemdescription
TitleGrowth Processes in the Initial Stages of Deposition of Ge Films on (100)Si Surfaces by GeH4 Source Molecular Beam Epitaxy
AuthorsKOIDE Y., ZAIMA S., OHSHIMA N., YASUDA Y.
Data nameJournal of Crystal Growth, Crystal Growth 1989, Part 1, Proceedings of the Ninth International Conference on Crystal Growth
Volume99
Num1-4
Page254-258
Year1990
PublisherNorth-Holland
LanguageEN
Abstract languageEN
ISSN00220248
GEOLIS URLhttps://darc.gsj.jp/archives/detail?cls=geolis&pkey=199002370
DOI10.1016/0022-0248(90)90522-M
@idhttps://gbank.gsj.jp/ld/resource/geolis/199002370