Geological Literature
In-Situ Observation of Impurity diffusion boundary Layer in Silicon Czochralski Growth
KAMIMOTO Koichi, EGUCHI Minoru, WATANABE Hisao, HIBIYA Taketoshi
| item | description |
|---|---|
| Title | In-Situ Observation of Impurity diffusion boundary Layer in Silicon Czochralski Growth |
| Authors | KAMIMOTO Koichi, EGUCHI Minoru, WATANABE Hisao, HIBIYA Taketoshi |
| Data name | Journal of Crystal Growth, Crystal Growth 1989, Part 2, Proceedings of the Ninth International Conference on Crystal Growth |
| Volume | 99 |
| Num | 1-4 |
| Page | 665-669 |
| Year | 1990 |
| Publisher | North-Holland |
| Language | EN |
| Abstract language | EN |
| ISSN | 00220248 |
| GEOLIS URL | https://darc.gsj.jp/archives/detail?cls=geolis&pkey=199001737 |
| DOI | 10.1016/S0022-0248(08)80003-6 |
| @id | https://gbank.gsj.jp/ld/resource/geolis/199001737 |