Photoacoustic and photoluminescence studies of porous silicon etched by low-concentration hydrofluoric acid

Authors=TOYODA T., TAKAHASHI T., SHEN Q.

Journal/Book_names=Journal of Applied Physics

volume=88

number=11

pages=6444-6450

Publish_year=2000

Publish_Country=USA

Publisher=American Institute of Physics

Language_of_Text=EN

Language_of_Abs=EN

ISSN=00218979

ID=200011906