Geological Literature Search (GEOLIS) (Geological Survey of Japan / AIST)

Characterization and application of fine-patterned Si/CoSi2/Si double heterostructures fabricated by self-aligned, two-step MBE

Authors=MIYAO Masanobu, NAKAGAWA Kiyokazu, NAKAMURA Nobuo, OHSHIMA Takashi

Journal/Book_names=Journal of Crystal Growth, Molecular Beam Epitaxy 1990, Proceedings of the Sixth International Conference on Molecular Beam Epitaxy

volume=111

number=1-4

pages=957-960

Publish_year=1991

Publish_Country=NLD

Publisher=North-Holland

Language_of_Text=EN

Language_of_Abs=EN

ISSN=00220248

DOI=10.1016/0022-0248(91)91114-P

ID=199104054

@id=https://gbank.gsj.jp/ld/resource/geolis/199104054